Navigating the European Shift: N-Methyl-2-pyrrolidone in Photoresist Stripping Applications
In the rapidly evolving landscape of semiconductor manufacturing, the role of solvents like N-Methyl-2-pyrrolidone (NMP ) in photoresist stripping processes has come under increased scrutiny, especially within the European market. As environmental regulations tighten and the demand for sustainable manufacturing practices grows, stakeholders are reevaluating the use of traditional solvents and exploring safer, more compliant alternatives.
2025-05
2025-05-19